Webinar #1: Innovative Substrates for GaN Power Electronics: Poly-AlN and Sputtered AlN films on Si
HiPERFORM NEWS 2021/05/04
Webinars   2021/05/04  

Date: Tuesday, May, 4th 2021 | 4 - 5 p.m.        Join Webinar

Innovative Substrates for GaN Power Electronics: Engineered Poly-AlN and Sputtered AlN films on Si

One approach pursued in the HiPERFORM project for innovative substrates for gallium nitride (GaN) power electronics is the use of a poly-Aluminium-nitride (poly-AlN) as substrate material. Imec already has demonstrated the potential of 200 mm poly-AlN substrates. The objective is now to develop 1.2 kV-rated GaN buffers on these substrates using metalorganic chemical vapor deposition (MOCVD). The current results look very promising and the first part of this webinar will focus on both the increased buffer breakdown as well as on the first full device lots processed on these innovative substrates.

Another approach for innovative substrates is the magnetron sputter deposition of AlN and GaN layers onto Si. Due to its higher deposition rate and lower required temperatures, compared to the conventional MOCVD process, reactive magnetron sputtering has the potential of a cost-efficient process and of lower stress in the films. The present status of epitaxial deposition of AlN thin films onto Si(111) wafer (2” and 8”) by reactive magnetron sputtering will be discussed in the second part of this webinar.

 

Speakers:

Prof. Dr. Benoit Bakeroot received the M.Sc. degree in physics in 1997 and the Ph.D. degree in electrical engineering in 2004 both from the Ghent University, Belgium. Since 1998, Benoit Bakeroot is with imec, where he has been involved in the research on Si and GaN power devices with a focus on Technology Computer-Aided Design (TCAD) simulations, compact modeling, and device physics. He is the author or co-author of more than 60 papers in international scientific journals and conference proceedings. He is currently also a part-time associate professor at the Ghent University.

Dr. Hagen Bartzsch studied Physics in Leipzig and Belfast and obtained his Ph.D. in 2000 for his works on reactive magnetron sputtering. Since 1994 he has been working at Fraunhofer FEP, presently as group leader static precision coating.